Dec 1, 1999
Sep 1, 1999
Sep 1, 1999
This whitepaper details a systematic methodology for concurrent development of reactor-scale physical model and model-based process control development for metal-organic chemical vapor deposition (MOCVD). The example used for illustrating the approach is the...
May 2, 1999
A 2D model of MOCVD reactor has been developed for deposition of YBCO thin films. System characterization showed the need for control of growth rate, deposition uniformity, and oxide stoichiometry at the surface. A run-to-run control architecture was developed, and is...
Dec 1, 1998
