Model-Based Control of MOCVD Rate, Uniformity and Stoichiometry

May 2, 1999

A 2D model of MOCVD reactor has been developed for deposition of YBCO thin films. System characterization showed the need for control of growth rate, deposition uniformity, and oxide stoichiometry at the surface. A run-to-run control architecture was developed, and is...

Run-to-Run Control of Static Systems

Dec 1, 1998

Run-to-run control using static linear models is examined. Conditions are presented for stability, (statistical) performance, and robustness using standard control theory. A simulation example shows the usefulness of the method applied to a rapid thermal oxidation...
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