Oct 1, 2000
Radio frequency (RF) diode sputtering deposition is a widely used process for depositing GMR thin films for multilayers, spin valves, spin-dependent tunneling (SDT) devices, etc. However, the thin films thus produced often show significant variation in GMR properties...
Sep 1, 1999
This whitepaper details a systematic methodology for concurrent development of reactor-scale physical model and model-based process control development for metal-organic chemical vapor deposition (MOCVD). The example used for illustrating the approach is the...
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