Control Design & Implementation

Control of Sputter Process for Improved Run-to-Run Repeatability

Oct 1, 2000

Radio frequency (RF) diode sputtering deposition is a widely used process for depositing GMR thin films for multilayers, spin valves, spin-dependent tunneling (SDT) devices, etc. However, the thin films thus produced often show significant variation in GMR properties...

Feedback Control of Morphology During III-V Semiconductor Growth by Molecular Beam Epitaxy

Dec 1, 1999

Reactor-Scale Modeling and Control for MOCVD of YBCO High Temperature Superconductors

Sep 1, 1999

This whitepaper details a systematic methodology for concurrent development of reactor-scale physical model and model-based process control development for metal-organic chemical vapor deposition (MOCVD). The example used for illustrating the approach is the...

Tradeoffs in Temperature Control of Fast-Ramp RTO and RTA Systems

Sep 1, 1999

Active Control in Structures

Jun 13, 1999

In this paper the application of control theory to structural engineering has been presented from a structural engineering perspective. The objective of this paper is to summarize key steps that are required to design an active control system for a structure. Total...