Control Design & Implementation

Feedback Control of Morphology During III-V Semiconductor Growth by Molecular Beam Epitaxy

Dec 1, 1999

Reactor-Scale Modeling and Control for MOCVD of YBCO High Temperature Superconductors

Sep 1, 1999

This whitepaper details a systematic methodology for concurrent development of reactor-scale physical model and model-based process control development for metal-organic chemical vapor deposition (MOCVD). The example used for illustrating the approach is the...

Tradeoffs in Temperature Control of Fast-Ramp RTO and RTA Systems

Sep 1, 1999

Active Control in Structures

Jun 13, 1999

In this paper the application of control theory to structural engineering has been presented from a structural engineering perspective. The objective of this paper is to summarize key steps that are required to design an active control system for a structure. Total...

Model-Based Control of MOCVD Rate, Uniformity and Stoichiometry

May 2, 1999

A 2D model of MOCVD reactor has been developed for deposition of YBCO thin films. System characterization showed the need for control of growth rate, deposition uniformity, and oxide stoichiometry at the surface. A run-to-run control architecture was developed, and is...