Silicon Epitaxy White Paper

Sep 1, 1999

In this white paper, we describe the numerical simulation of CVD process for epitaxial growth of silicon using trichlorosilane (SiHCl3). This study uses the one-step, finite-rate chemistry for the 2-D reactor geometry from the literature, and successfully reproduces...

A Physical Model for Drying of Gelcast Ceramics

May 1, 1999

Gelcasting is a promising new technology for manufacturing advanced structural ceramic components. The process involves drying of the ‘green’ gelcast part before densiï¬cation. The physical mechanisms controlling this relatively long drying process are...
error: Content is protected !!