Jan 1, 2001
Part of a collection of contributions written in honor of Professor Brian Anderson's 60th birthday.
Dec 1, 2000
Nov 30, 2000
A reactor-scale model incorporating the principal physical processes involved in RF diode sputtering has been developed and then integrated into a detailed steady-state input-output model of the growth of copper films. The model links critical aspects of the process...
Nov 1, 2000
Oct 1, 2000
Radio frequency (RF) diode sputtering deposition is a widely used process for depositing GMR thin films for multilayers, spin valves, spin-dependent tunneling (SDT) devices, etc. However, the thin films thus produced often show significant variation in GMR properties...
