This presentation describes the development of model-based temperature control of the susceptor of a Metal-Organic Chemical Vapor Deposition (MOCVD) reactor. A generic axisymmetric geometry has been used together with representative process conditions to highlight the issues related to the control of process temperature. Additionally, we describe a method for estimating the minimum number of independent heaters that are needed to attain the desired thermal performance for a range of process conditions.
Optimization of Heater Zone Layout for a Rotating Susceptor in a Cold-wall MOCVD Reactor
Jon Ebert, Dick de Roover, Sarbajit Ghosal, Abbas Emami-Naeini
Presentation at APC Conference XXIX, Austin, TX, October 9-12, 2017